[PDF.59rl] Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Materials Science and Process Technology)

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Materials Science and Process Technology)

[PDF.zv69] Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Materials Science and Process Technology)

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 | #4180275 in Books |  Noyes Publications |  1993-01-14 | Original language:English | PDF # 1 |  9.21 x.63 x6.14l,1.05 | File type: PDF | 251 pages

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|| |"After reading this book, an engineer should have all the necessary background." - European Semiconductor

This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.

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