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Advanced Interconnects for ULSI Technology
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| #4519675 in Books | 2012-04-02 | Original language:English | PDF # 1 | 10.00 x1.30 x7.00l,2.20 | File type: PDF | 606 pages||From the Back Cover|Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices whi
Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices which combine over a billion transistors onto a single chip, the increased resistance and RC-delay at the smaller scale has become a significant factor affecting chip performance.
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